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Microstructure of the relaxed (001) Si surface

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dc.contributor.author Ків, Арнольд Юхимович
dc.contributor.author Maximova, T. I.
dc.contributor.author Соловйов, Володимир Миколайович
dc.date.accessioned 2017-08-16T20:10:57Z
dc.date.available 2017-08-16T20:10:57Z
dc.date.issued 1999-10
dc.identifier.citation Kiv A. E. Microstructure of the relaxed (001) Si surface / A. E. Kiv, T. I. Maximova, V. N. Soloviev // AM’99: Internationa Conference “Advanced Materials”. 3-7 October 1999, Kiev, Ukraine : Abstracts of Symposium B: Functional Materials for Information Recording and Radiation Monitoring. – 1999. – P. 11. uk
dc.identifier.uri http://elibrary.kdpu.edu.ua/handle/0564/1244
dc.identifier.uri https://doi.org/10.31812/0564/1244
dc.description 1. F.H. Stillinger, T.A. Weber, Phys. Rev., B31, 9262 (1985) 2. P.W. Jacobs, A.E. Kiv, R.M. Balabay et al., RAU Sci. Rep., Computer modeling & New Technologies, 2, 15, (1998)
dc.description.abstract We have applied molecular dynamics method and semi-empirical potential [1] to obtain the realistic picture of Si surface layers relaxation. The starting configuration was taken as a parallelepiped containing 864 atoms. There were 12 layers with 72 atoms in each one. Periodic boundary conditions were used in two dimensions. uk
dc.language.iso en uk
dc.subject molecular dynamics uk
dc.subject semi-empirical potential uk
dc.subject angle distribution function uk
dc.subject quasi-disordered phase uk
dc.title Microstructure of the relaxed (001) Si surface uk
dc.type Article uk


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