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| dc.contributor.author | Ків, Арнольд Юхимович | |
| dc.contributor.author | Maximova, T. I. | |
| dc.contributor.author | Соловйов, Володимир Миколайович | |
| dc.date.accessioned | 2017-08-16T19:51:00Z | |
| dc.date.available | 2017-08-16T19:51:00Z | |
| dc.date.issued | 2002-08 | |
| dc.identifier.citation | Kiv A. E. Microscopic Mechanisms of Nucleatlon and Diffusion in Quenched Al-Si Alloys / Dr. A E. Kiv, Dr. T. I. Maximova, Dr. V. N. Soloviev // RQ11 - Rapidly Quenched & Metastable Materials. - Oxford University, U.K., 25-30th August 2002. | uk |
| dc.identifier.uri | http://elibrary.kdpu.edu.ua/handle/0564/1242 | |
| dc.identifier.uri | https://doi.org/10.31812/0564/1242 | |
| dc.description.abstract | Si precipitates formation in Al-Si alloys is a subject of many investigations. Al alloys are widely used as structural materials in nuclear reactors and have many other important applications. | uk |
| dc.language.iso | en | uk |
| dc.subject | nucleation | uk |
| dc.subject | diffusion | uk |
| dc.subject | computer simulation | uk |
| dc.subject | vacancy defects | uk |
| dc.title | Microscopic Mechanisms of Nucleatlon and Diffusion in Quenched Al-Si Alloys | uk |
| dc.type | Article | uk |
