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Radiation-stimulated processes in Si surface layers

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dc.contributor.author Jacobs, Patrick W. M.
dc.contributor.author Ків, Арнольд Юхимович
dc.contributor.author Соловйов, Володимир Миколайович
dc.contributor.author Maximova, Tatyana N.
dc.contributor.author Chislov, Valery V.
dc.date.accessioned 2017-07-08T18:18:37Z
dc.date.available 2017-07-08T18:18:37Z
dc.date.issued 1999
dc.identifier.citation Jacobs P. W. M. Radiation-stimulated processes in Si surface layers / Patrick W. M. Jacobs, Arnold E. Kiv, Vladimir N. Soloviev, Tatyana N. Maximova, Valery V. Chislov // SPIE Proceedings [SPIE International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering - St. Petersburg, Russia (Monday 8 June 1998)] International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering NDTCS-98. – 1999. – Vol. 3687. – Pp. 170-174. uk
dc.identifier.issn 0277-786X
dc.identifier.uri http://elibrary.kdpu.edu.ua/handle/0564/1021
dc.identifier.uri https://doi.org/10.1117/12.347417
dc.description [1] Chadi D.J. (1979) Dimer configurations at Si surface. Phys. Rev. Lett. 43, 43 [2] Zhu Z., Shima N., Tsukada V. (1989) New types of dimers in Si. Phys. Rev. B 40,11868 [3] Dabrovski J., Scheffler V. (1992) Transitions between dimer configurations in Si. Appl. Surf. Sci. 56 -58, 15 [4] Alien M.P., Tildesley D.J. (1987) Computer simulations in liquids. Oxford University Press, Oxford [5] Keating P.N. (1966) Interatomic potential in Si. Phys. Rev. 145, 637 [6] Stillinger F.H., Weber T.A. (1985) New interatomic potential for Si. Phys. Rev. B 31, 52-62 [7] Blochi P.E., Smargiassi E., Car R., Laks D.B., S.T. (1993) Pantelides ab initio calculations of Si electronic structure. Phys. Rev. Lett. 70, 2435 [8] Jacobs P.W., Kiv A.E., Balabay R.M. et al. (1998) RAU Sci. Rep. Computer modelling & New Technologies 2, 15-20 [9] Kiv A.E., Kovalchuk V.V., Yanchuk V.A. (1989) H adsorption by disordered Si clusters. Phys. Stat. Sol.(b) 156, K101-K104 [10] Britavskaya E.P., Chislov V.V., Kiv A.E. et al. (1995) Surface disordered phase in semiconductors. Ukr. Phys. J. 40, 698-701
dc.description.abstract Molecular dynamics computer simulations have been perfonned to study the character of disordering of atom configurations in Si surface layers. The relaxation of free Si surface was investigated. The main structural parameters were calculated, such as a distribution of angles between chemical bonds, the density of dangling bonds, structural peculiarities of Si surface layers and radiation effects. It was concluded that Si surface at real conditions is a disordered phase similar to a-Si [1]. uk
dc.language.iso en_US uk
dc.publisher SPIE uk
dc.subject Si surface uk
dc.subject molecular dynamics uk
dc.subject relaxation processes uk
dc.subject radiation effects uk
dc.title Radiation-stimulated processes in Si surface layers uk
dc.type Article uk


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