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http://elibrary.kdpu.edu.ua/xmlui/handle/0564/1026Повний запис метаданих
| Поле DC | Значення | Мова |
|---|---|---|
| dc.contributor.author | Ків, Арнольд Юхимович | - |
| dc.contributor.author | Соловйов, Володимир Миколайович | - |
| dc.contributor.author | Maximova, Tatiana I. | - |
| dc.date.accessioned | 2017-07-09T11:32:06Z | - |
| dc.date.available | 2017-07-09T11:32:06Z | - |
| dc.date.issued | 2000 | - |
| dc.identifier.citation | Kiv A. E. Microstructure of the relaxed (001) Si surface / A. E. Kiv, V. N. Soloviev, T. I. Maximova // Semiconductor Physics, Quantum Electronics & Optoelectronics. – 2000. – V. 3, N. 2. – Pp. 157-160. | uk |
| dc.identifier.issn | 1560-8034 | - |
| dc.identifier.uri | http://elibrary.kdpu.edu.ua/handle/0564/1026 | - |
| dc.identifier.uri | https://doi.org/10.15407/spqeo3.02.157 | - |
| dc.description | 1. G. P. Srivastova, Rep. Prog. Phys, 60, N5 pp. 561-613 (1997). 2. F. Bechstedt, R. Enderline, Semiconductor Surfaces and Interfaces (Their Atomic and Electronic Structures), Akademie-Verlag, Berlin (1988). 3. F. F. Abraham, I. P. Batra, Surf Sci. 163, L752-L758 (1985) 4. Z. M. Khakimov. Computer Mater. Sci.3 (1), pp. 94-108 (1994). 5. I. P. Lisovskyy, V.G. Litovchenko, W. Fussel, A. E. Kiv, Intern. Conf. on POLYSE 2000. 6. P. X. Zhang, I. V. Mitchell, B. Y. Tong et al, Phys. Rev, B 50 (23) pp. 17080-17084, (1994). 7. L. J. Huang, W. M. Lau, H. T. Tang et al, Phys. Rev, B 50 (24) pp.18453-18468, (1994). 8. F. H. Stillinger, T. A .Weber, Phys Rev, B 31 (2) pp. 5262- 5267, (1984) 9. P.W. Jacobs, A.E. Kiv, R.M. Balabay et al, Computer Modelling&New Technologies, 3 (1), p.15-21, (1998) 10. Farid F. Abraham, Inder P. Batra, Surface Sci. Lett. 163 (2), L752, (1985). 11. J. Dabrovski, M. Scheffler, Appl. Surf. Sci. 56-58 (1), pp. 15- 22, (1992). 12. Y. S. Vavilov, A. E. Kiv, O. R. Niyazova, Mechanisms of formation and migration of defects in semiconductors, Nauka, M., 1981. 13. A. E. Kiv, V. N. Soloviev, Phys. Stat. Sol. (b), 94, pp. k91- k95, (1979), (in Russian). 14. Ivor Brodie and Julius J. Muray, The Physics of Microfabrication, Chap 5, Plenum Press, New York and London, (1982) 15. L.S.O. Johansson, R.I.G. Uhrberg, P. Martensson and G. V. Hansson, Phys. Rev, B42 (1), pp. 1305-1310, (1990) | - |
| dc.description.abstract | MD computer simulation with the Stillinger-Weber potential have been performed to study a microstructure of silicon surface layers and relaxation processes induced by low energy ion beams. New peculiarities of relaxed (001) silicon surface were discovered by using the improved calculation scheme for diamond-like structure simulation. It was established that the relaxed microstructure of clean (001) Si surface is characterized by dangling bonds in the first three near-surface layers and by non-hexagonal polygons. Besides, the dimer formation was observed not only in the first layer. New space configurations of dimers were found. Ascertained were some conditions which lead to the effect of radiation-stimulated relaxation of surface layers under the ion bombardment in the energy region of the threshold of elastic atomic displacements in silicon. | uk |
| dc.language.iso | en_US | uk |
| dc.subject | silicon surface | uk |
| dc.subject | molecular dynamics | uk |
| dc.subject | radiation-stimulated processes | uk |
| dc.title | Microstructure of the relaxed (001) Si surface | uk |
| dc.type | Article | uk |
| Розташовується у зібраннях: | Кафедра інформатики та прикладної математики | |
Файли цього матеріалу:
| Файл | Опис | Розмір | Формат | |
|---|---|---|---|---|
| Kiv_Soloviev_Maximova.pdf | Article | 1.66 MB | Adobe PDF | Переглянути/Відкрити |
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